Thermoelectric study of Sb (III) doped bismuth tellurium selenide ,Bi2-x Sbx(Te1-xSex)3 thin films were done.They are deposited by Arrested Precipitation Technique (APT). These thin films were prepared using a complexing agent triethanolamine (TEA) and a reducing agent sodium sulphite to avoid hydroxide formation of bismuth precursor Bi (NO3)3 and antimony precursor (SbCl3) in aqueous medium to favor the reaction with Te2- and Se2-chalcogen ions. The preparative conditions such as pH, concentration of precursors, temperature, rate of agitation and time were finalized at initial stages of deposition. As deposited films were annealed at constant temperature (373K) in muffle furnace and then characterized for optostructural, morphological, thermoelectric and figure of merit (ZT). The results demonstrate that the Bi2-x Sbx(Te1-xSex)3 thin films prepared by APT shows band gap in the range 1.46eV to 1.89eV. X-Ray Diffraction (XRD) pattern, Scanning Electron Microscopy (SEM) images reveals that Bi2-x Sbx(Te1-xSex)3 mixed metal chalcogenide films are of nanocrystalline nature and have rhombohedral structure and better morphology. EDAX study shows good stoichiometry. Electrical and TEP study shows Sb(III) doping in Bi2(Te1-xSex)3 mixed metal chalcogenide thin films are semiconducting having p-type conduction mechanism. The highest figure of merit obtained was 0.312 and 0.569 for D1 to D5 samples.
Published in | International Journal of Materials Science and Applications (Volume 2, Issue 1) |
DOI | 10.11648/j.ijmsa.20130201.14 |
Page(s) | 30-36 |
Creative Commons |
This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited. |
Copyright |
Copyright © The Author(s), 2013. Published by Science Publishing Group |
APT, Metal chalcogenides, X-ray diffraction, XPS
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APA Style
S. M. Patil, M. M. Salunkhe, N. B. Pawar, P. N. Bhosale. (2013). Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt. International Journal of Materials Science and Applications, 2(1), 30-36. https://doi.org/10.11648/j.ijmsa.20130201.14
ACS Style
S. M. Patil; M. M. Salunkhe; N. B. Pawar; P. N. Bhosale. Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt. Int. J. Mater. Sci. Appl. 2013, 2(1), 30-36. doi: 10.11648/j.ijmsa.20130201.14
AMA Style
S. M. Patil, M. M. Salunkhe, N. B. Pawar, P. N. Bhosale. Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt. Int J Mater Sci Appl. 2013;2(1):30-36. doi: 10.11648/j.ijmsa.20130201.14
@article{10.11648/j.ijmsa.20130201.14, author = {S. M. Patil and M. M. Salunkhe and N. B. Pawar and P. N. Bhosale}, title = {Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt}, journal = {International Journal of Materials Science and Applications}, volume = {2}, number = {1}, pages = {30-36}, doi = {10.11648/j.ijmsa.20130201.14}, url = {https://doi.org/10.11648/j.ijmsa.20130201.14}, eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ijmsa.20130201.14}, abstract = {Thermoelectric study of Sb (III) doped bismuth tellurium selenide ,Bi2-x Sbx(Te1-xSex)3 thin films were done.They are deposited by Arrested Precipitation Technique (APT). These thin films were prepared using a complexing agent triethanolamine (TEA) and a reducing agent sodium sulphite to avoid hydroxide formation of bismuth precursor Bi (NO3)3 and antimony precursor (SbCl3) in aqueous medium to favor the reaction with Te2- and Se2-chalcogen ions. The preparative conditions such as pH, concentration of precursors, temperature, rate of agitation and time were finalized at initial stages of deposition. As deposited films were annealed at constant temperature (373K) in muffle furnace and then characterized for optostructural, morphological, thermoelectric and figure of merit (ZT). The results demonstrate that the Bi2-x Sbx(Te1-xSex)3 thin films prepared by APT shows band gap in the range 1.46eV to 1.89eV. X-Ray Diffraction (XRD) pattern, Scanning Electron Microscopy (SEM) images reveals that Bi2-x Sbx(Te1-xSex)3 mixed metal chalcogenide films are of nanocrystalline nature and have rhombohedral structure and better morphology. EDAX study shows good stoichiometry. Electrical and TEP study shows Sb(III) doping in Bi2(Te1-xSex)3 mixed metal chalcogenide thin films are semiconducting having p-type conduction mechanism. The highest figure of merit obtained was 0.312 and 0.569 for D1 to D5 samples.}, year = {2013} }
TY - JOUR T1 - Synthesis and Thermoelectric Study of Sb (III) Doped Bi2(Te1-Xsex)3 Thin Films by Apt AU - S. M. Patil AU - M. M. Salunkhe AU - N. B. Pawar AU - P. N. Bhosale Y1 - 2013/01/10 PY - 2013 N1 - https://doi.org/10.11648/j.ijmsa.20130201.14 DO - 10.11648/j.ijmsa.20130201.14 T2 - International Journal of Materials Science and Applications JF - International Journal of Materials Science and Applications JO - International Journal of Materials Science and Applications SP - 30 EP - 36 PB - Science Publishing Group SN - 2327-2643 UR - https://doi.org/10.11648/j.ijmsa.20130201.14 AB - Thermoelectric study of Sb (III) doped bismuth tellurium selenide ,Bi2-x Sbx(Te1-xSex)3 thin films were done.They are deposited by Arrested Precipitation Technique (APT). These thin films were prepared using a complexing agent triethanolamine (TEA) and a reducing agent sodium sulphite to avoid hydroxide formation of bismuth precursor Bi (NO3)3 and antimony precursor (SbCl3) in aqueous medium to favor the reaction with Te2- and Se2-chalcogen ions. The preparative conditions such as pH, concentration of precursors, temperature, rate of agitation and time were finalized at initial stages of deposition. As deposited films were annealed at constant temperature (373K) in muffle furnace and then characterized for optostructural, morphological, thermoelectric and figure of merit (ZT). The results demonstrate that the Bi2-x Sbx(Te1-xSex)3 thin films prepared by APT shows band gap in the range 1.46eV to 1.89eV. X-Ray Diffraction (XRD) pattern, Scanning Electron Microscopy (SEM) images reveals that Bi2-x Sbx(Te1-xSex)3 mixed metal chalcogenide films are of nanocrystalline nature and have rhombohedral structure and better morphology. EDAX study shows good stoichiometry. Electrical and TEP study shows Sb(III) doping in Bi2(Te1-xSex)3 mixed metal chalcogenide thin films are semiconducting having p-type conduction mechanism. The highest figure of merit obtained was 0.312 and 0.569 for D1 to D5 samples. VL - 2 IS - 1 ER -