A Practical Electrode for Microwave Plasma Processes

Hiromichi Toyota; Shinfuku Nomura; Shinobu Mukasa

doi:doi:10.11648/j.ijmsa.20130203.12

| Peer-Reviewed

A Practical Electrode for Microwave Plasma Processes

Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa

Published in International Journal of Materials Science and Applications (Volume 2, Issue 3)

Received: 10 April 2013 Published: 2 May 2013

Views: Downloads:

Download PDF

Share This Article

Twitter
Linked In
Facebook

Abstract

In-liquid plasma chemical vapor deposition (CVD) method is useful for high speed production of high quality diamond films. The method is simple and secure comparing usual CVD methods. In this paper, new electrodes for in-liquid plasma CVD by receiving microwaves are developed and introduced. This paper examines the fabrication of electrodes that enable the generation of plasma by effectively receiving microwaves. The fabricated electrodes are used to generate plasma in a waste liquid and the performance of the electrode is evaluated by the speed at which gases are created by decomposing the liquid. By using experiments in decomposing n-dodecane using in-liquid plasma and through detailed investigation into the length of the electrode used, it is confirmed that the half wavelength is optimal for the generation of plasma. The fabri-cated electrodes are used to test the formation of diamond film by plasma CVD in the microwave oven. Diamond film is successfully created inside microwave oven by using the vapor from a mixture of methanol and ethanol.

Published in	International Journal of Materials Science and Applications (Volume 2, Issue 3)
DOI	10.11648/j.ijmsa.20130203.12
Page(s)	83-88
Creative Commons	This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.
Copyright	Copyright © The Author(s), 2013. Published by Science Publishing Group

Keywords

In-Liquid Plasma, Electrode, Microwave, Plasma CVD

References

[1]	S. Yugo, T. Kanai, T. Kimura, and T. Muto, "Generation of diamond nuclei by electric field in plasma chemical vapor deposition," Appl. Phys. Lett., vol. 58, pp. 1036-1038, September 1990.
[2]	Z. Sun, C.H. Lin, Y.L. Lee, J.R. Shi, B.K. Tay, X. Shi, "Effects on the deposition and mechanical properties of diamond-like carbon film using different inert gases in methane plasma," Thin Solid Films, pp. 198-202, 2000.
[3]	L.C. Qin, D. Zhou, A.R. Krauss, and D.M. Gruen, "Growing carbon nanotubes by microwave plasma-enhanced chemical vapor deposition," Appl. Phys. Lett., vol. 72, pp. 3437–3439, November 1997.
[4]	H.S. Kim, Y.J. Parka, I.H. Choi, Y-.J. Baik, "-SiC Thin film growth using microwave plasma activated CH4-SiH4 sources," Thin Solid Films,vol. 341, pp. 42-46, 1999.
[5]	J. Wei, H. Kawarada, J. Suzuki and A. Hiraki, "Growth of diamond films at low pressure using magneto-microwave plasma CVD," J. Crystal Growth, vol. 99, 1201-1205, 1990.
[6]	K. Mitani, "The direct current associated with microwave gas discharge between coaxial cylinders," J. Phys. Society of Japan, vol. 7, No. 6, pp. 634-636, July 1952.
[7]	L. Bardosh and Yu. A. Lebedev, "Spherical microwave electrode discharge. Phenomenology and results of probe measurements," TECHNICAL PHYSICS, vol. 43, No. 12. pp. 1428-1431, July 1997.
[8]	S. Nomura, H. Toyota, S. Mukasa, H. Yamashita, T. Maehara, and A. Kawashima, "Production of hydrogen in a conventional microwave oven," J. Appl. Phys., vol. 106, pp. 073306-1-073306-4, June 2009.
[9]	M. Miosan, G. Sauve, Z. Zakrewski and J. Hubert, "An atmospheric pressure waveguide-fed microwave plasma torch: the TIA design," Plasma Source Sci. Technol., vol. 3, pp. 584-592, August 1994.
[10]	B. Cranganu-Cretua, F. I. Hantila, T. Leuca, "Microwave ovens electromagnetic field analysis by means of boundary element method," Journal of Materials Processing Technology, vol. 161, pp. 305-310, 2005.
[11]	M. Kamo, "Synthesis of diamond from gas phase and its properties," THE RIGAKU JOURNAL, vol. 7, No. 2, pp. 22-27, 1990.
[12]	V. Mortet, A. Kromka, R. Kravets, J. Rosa, V. Vorlicek, J. Zemek, M. Vanecek, "Investigation of diamond growth at high pressure by microwave plasma chemical vapor deposition," Diamond Relat. Mater., vol. 13, pp. 604-609, 2004.
[13]	A. Chayahara, Y. Mokuno, Y. Horino, Y. Takasu, H. Kato, H. Yoshikawa, N. Fujimori, "The effect of nitrogen addition during high-rate homoepitaxial growth of diamond by microwave plasma CVD," Diamond Relat. Mater., vol. 13, pp. 1954-1958, September 2004.
[14]	T. Teraji, M. Hamada, H. Wada, M. Yamamoto, K. Arima, T. Ito, "High rate growth and electrical/optical properties of high-quality homoepitaxial diamond (100) films," Diamond Relat. Mater., vol. 14, pp. 255-260, January 2005.
[15]	X. Li, J. Perkins, R. Collazo, R. J. Nemanich, Z. Sitar, "Investigation of the effect of the total pressure and methane concentration on the growth rate and quality of diamond thin films grown by MPCVD," Diamond Relat. Mater., vol. 15, pp. 1784-1788, November 2006.
[16]	Y. Tzeng, Y. K. Liu, "Diamond CVD by microwave plasmas in argon-diluted methane without or with 2% hydrogen additive," Diamond Relat. Mater., vol. 14, pp. 261-265, December 2004.
[17]	S. Hiraga, S. Shimada, Y. Takagi, K. Kuribayashi, T. Hayashi, "Hydrogen-free CVD diamond synthesis," Superlattices and Microstructures, vol. 40, pp. 519–525, September 2006.
[18]	H. Toyota, S. Nomura, S. Mukasa, H. Yamashita, T. Shimo, S. Okuda, "A consideration of ternary C–H–O diagram for diamond deposition using microwave in-liquid and gas phase plasma," Diamond Relat. Mater., vol. 20, pp. 1255-1258, July 2011.
[19]	P. K. Bachmann, D. Leers, H. Lydtin, "Toword a general concept of diamond chemical vapour deposition," Diamond Relat. Mater., vol. 1, pp. 1-12, July 1991.
[20]	Y. Takahashi, H. Toyota, S. Nomura, S. Mukasa and T. Inoue, "A comparison of diamond growth rate using in-liquid and conventional plasma chemical vapor deposition methods," J. Appl. Phys., vol. 105, pp. 113306-1-113306-4, November 2008.

Cite This Article

Plain Text BibTeX RIS

APA Style

Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa. (2013). A Practical Electrode for Microwave Plasma Processes. International Journal of Materials Science and Applications, 2(3), 83-88. https://doi.org/10.11648/j.ijmsa.20130203.12

Copy | Download

ACS Style

Hiromichi Toyota; Shinfuku Nomura; Shinobu Mukasa. A Practical Electrode for Microwave Plasma Processes. Int. J. Mater. Sci. Appl. 2013, 2(3), 83-88. doi: 10.11648/j.ijmsa.20130203.12

Copy | Download

AMA Style

Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa. A Practical Electrode for Microwave Plasma Processes. Int J Mater Sci Appl. 2013;2(3):83-88. doi: 10.11648/j.ijmsa.20130203.12

Copy | Download

@article{10.11648/j.ijmsa.20130203.12,
  author = {Hiromichi Toyota and Shinfuku Nomura and Shinobu Mukasa},
  title = {A Practical Electrode for Microwave Plasma Processes},
  journal = {International Journal of Materials Science and Applications},
  volume = {2},
  number = {3},
  pages = {83-88},
  doi = {10.11648/j.ijmsa.20130203.12},
  url = {https://doi.org/10.11648/j.ijmsa.20130203.12},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ijmsa.20130203.12},
  abstract = {In-liquid plasma chemical vapor deposition (CVD) method is useful for high speed production of high quality diamond films. The method is simple and secure comparing usual CVD methods. In this paper, new electrodes for in-liquid plasma CVD by receiving microwaves are developed and introduced. This paper examines the fabrication of electrodes that enable the generation of plasma by effectively receiving microwaves. The fabricated electrodes are used to generate plasma in a waste liquid and the performance of the electrode is evaluated by the speed at which gases are created by decomposing the liquid. By using experiments in decomposing n-dodecane using in-liquid plasma and through detailed investigation into the length of the electrode used, it is confirmed that the half wavelength is optimal for the generation of plasma. The fabri-cated electrodes are used to test the formation of diamond film by plasma CVD in the microwave oven. Diamond film is successfully created inside microwave oven by using the vapor from a mixture of methanol and ethanol.},
 year = {2013}
}

Copy | Download

TY  - JOUR
T1  - A Practical Electrode for Microwave Plasma Processes
AU  - Hiromichi Toyota
AU  - Shinfuku Nomura
AU  - Shinobu Mukasa
Y1  - 2013/05/02
PY  - 2013
N1  - https://doi.org/10.11648/j.ijmsa.20130203.12
DO  - 10.11648/j.ijmsa.20130203.12
T2  - International Journal of Materials Science and Applications
JF  - International Journal of Materials Science and Applications
JO  - International Journal of Materials Science and Applications
SP  - 83
EP  - 88
PB  - Science Publishing Group
SN  - 2327-2643
UR  - https://doi.org/10.11648/j.ijmsa.20130203.12
AB  - In-liquid plasma chemical vapor deposition (CVD) method is useful for high speed production of high quality diamond films. The method is simple and secure comparing usual CVD methods. In this paper, new electrodes for in-liquid plasma CVD by receiving microwaves are developed and introduced. This paper examines the fabrication of electrodes that enable the generation of plasma by effectively receiving microwaves. The fabricated electrodes are used to generate plasma in a waste liquid and the performance of the electrode is evaluated by the speed at which gases are created by decomposing the liquid. By using experiments in decomposing n-dodecane using in-liquid plasma and through detailed investigation into the length of the electrode used, it is confirmed that the half wavelength is optimal for the generation of plasma. The fabri-cated electrodes are used to test the formation of diamond film by plasma CVD in the microwave oven. Diamond film is successfully created inside microwave oven by using the vapor from a mixture of methanol and ethanol.
VL  - 2
IS  - 3
ER  -

Copy | Download

Author Information

Hiromichi Toyota

Graduate School of Science and Engineering, Ehime University, 3 Bunkyo-cho, Matsuyama, Ehime 791-8577, Japan
Shinfuku Nomura

Graduate School of Science and Engineering, Ehime University, 3 Bunkyo-cho, Matsuyama, Ehime 791-8577, Japan
Shinobu Mukasa

Graduate School of Science and Engineering, Ehime University, 3 Bunkyo-cho, Matsuyama, Ehime 791-8577, Japan

Download PDF

Sections

Plain Text BibTeX RIS

APA Style

Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa. (2013). A Practical Electrode for Microwave Plasma Processes. International Journal of Materials Science and Applications, 2(3), 83-88. https://doi.org/10.11648/j.ijmsa.20130203.12

Copy | Download

ACS Style

Hiromichi Toyota; Shinfuku Nomura; Shinobu Mukasa. A Practical Electrode for Microwave Plasma Processes. Int. J. Mater. Sci. Appl. 2013, 2(3), 83-88. doi: 10.11648/j.ijmsa.20130203.12

Copy | Download

AMA Style

Hiromichi Toyota, Shinfuku Nomura, Shinobu Mukasa. A Practical Electrode for Microwave Plasma Processes. Int J Mater Sci Appl. 2013;2(3):83-88. doi: 10.11648/j.ijmsa.20130203.12

Copy | Download

@article{10.11648/j.ijmsa.20130203.12,
  author = {Hiromichi Toyota and Shinfuku Nomura and Shinobu Mukasa},
  title = {A Practical Electrode for Microwave Plasma Processes},
  journal = {International Journal of Materials Science and Applications},
  volume = {2},
  number = {3},
  pages = {83-88},
  doi = {10.11648/j.ijmsa.20130203.12},
  url = {https://doi.org/10.11648/j.ijmsa.20130203.12},
  eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.ijmsa.20130203.12},
  abstract = {In-liquid plasma chemical vapor deposition (CVD) method is useful for high speed production of high quality diamond films. The method is simple and secure comparing usual CVD methods. In this paper, new electrodes for in-liquid plasma CVD by receiving microwaves are developed and introduced. This paper examines the fabrication of electrodes that enable the generation of plasma by effectively receiving microwaves. The fabricated electrodes are used to generate plasma in a waste liquid and the performance of the electrode is evaluated by the speed at which gases are created by decomposing the liquid. By using experiments in decomposing n-dodecane using in-liquid plasma and through detailed investigation into the length of the electrode used, it is confirmed that the half wavelength is optimal for the generation of plasma. The fabri-cated electrodes are used to test the formation of diamond film by plasma CVD in the microwave oven. Diamond film is successfully created inside microwave oven by using the vapor from a mixture of methanol and ethanol.},
 year = {2013}
}

Copy | Download

TY  - JOUR
T1  - A Practical Electrode for Microwave Plasma Processes
AU  - Hiromichi Toyota
AU  - Shinfuku Nomura
AU  - Shinobu Mukasa
Y1  - 2013/05/02
PY  - 2013
N1  - https://doi.org/10.11648/j.ijmsa.20130203.12
DO  - 10.11648/j.ijmsa.20130203.12
T2  - International Journal of Materials Science and Applications
JF  - International Journal of Materials Science and Applications
JO  - International Journal of Materials Science and Applications
SP  - 83
EP  - 88
PB  - Science Publishing Group
SN  - 2327-2643
UR  - https://doi.org/10.11648/j.ijmsa.20130203.12
AB  - In-liquid plasma chemical vapor deposition (CVD) method is useful for high speed production of high quality diamond films. The method is simple and secure comparing usual CVD methods. In this paper, new electrodes for in-liquid plasma CVD by receiving microwaves are developed and introduced. This paper examines the fabrication of electrodes that enable the generation of plasma by effectively receiving microwaves. The fabricated electrodes are used to generate plasma in a waste liquid and the performance of the electrode is evaluated by the speed at which gases are created by decomposing the liquid. By using experiments in decomposing n-dodecane using in-liquid plasma and through detailed investigation into the length of the electrode used, it is confirmed that the half wavelength is optimal for the generation of plasma. The fabri-cated electrodes are used to test the formation of diamond film by plasma CVD in the microwave oven. Diamond film is successfully created inside microwave oven by using the vapor from a mixture of methanol and ethanol.
VL  - 2
IS  - 3
ER  -

Copy | Download